Intel has begun using ASML’s next-generation High-NA extreme ultraviolet (EUV) lithography machine to manufacture its flagship Panther Lake laptop chips, the Dutch equipment maker confirmed.
The deployment involves a single high-end tool, valued at approximately $400 million, marking a strategic step in Intel’s efforts to master advanced node production techniques.
The decision underscores Intel’s commitment to integrating cutting-edge equipment into its fabrication lines.
By utilizing the High-NA EUV system, Intel aims to enhance its learning curve and operational proficiency with the technology, which is critical for producing smaller, more efficient transistors.
This move is part of a broader strategy to strengthen Intel’s foundry capabilities and compete more effectively in the advanced semiconductor manufacturing space.
For investors, the deployment highlights Intel’s ongoing capital intensity and its focus on technological leadership.