Intel has confirmed it will utilize ASML's next-generation High-NA extreme ultraviolet (EUV) lithography tools to manufacture its flagship Panther Lake laptop processors.
The Dutch equipment maker disclosed the development on Tuesday, marking a significant step in Intel's efforts to advance its process technology and regain manufacturing leadership.
The decision underscores Intel's commitment to integrating the most advanced lithography available into its production flow.
By deploying High-NA EUV for Panther Lake, Intel aims to improve yield and performance metrics for its upcoming mobile chip lineup.
This move also provides ASML with a critical early customer for its latest tooling, helping the company refine operational efficiency and validate the technology at scale.
For market participants, the announcement reinforces the tight coupling between Intel's foundry ambitions and ASML's equipment cycle.